NanoIC is designed to accelerate the development of next-generation semiconductor technology, supporting applications in AI, autonomous vehicles, healthcare and 6G mobile technology. It is the first European facility to deploy the most advanced Extreme Ultraviolet (EUV) lithography machine, enabling the design and production of chips beyond two nanometres.
The facility follows an open access model, allowing start-ups, researchers, SMEs and large organisations to test new chip designs, equipment, and processes at near-industrial scale before full production. It is hosted by IMEC, with partners including CEA-Leti (France), Fraunhofer (Germany), VTT (Finland), CSSNT (Romania) and Tyndall National Institute (Ireland).
NanoIC is intended to bridge the gap “from lab to fab”, serving as a key pillar of the Chips for Europe initiative. The pilot lines aim to strengthen Europe’s position in the global semiconductor supply chain, support industrial competitiveness, and help retain and attract talent.
NanoIC follows the opening of the FAMES pilot line earlier in January this year and is part of a network of five pilot lines (NanoIC, FAMES, APECS, WBG and PIXEurope) representing a combined EU and national investment of EUR 3.7 billion.
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